Single Crystal
Micromachining Using Multiple Fusion Bonded Layers SPIE's 2000
Symposium and Education Program on Micromachining and Microfabrication,
Micromachining and Microfabrication Process Technology VI, Santa Clara,
California, Sept 18-20 2000, Paper 4174-48 (pdf,
174,346 bytes)
Bonded Silicon
Silicide on Insulator (S2OI) A Study of Chemical, Physical
and Optical Properties for Advanced Device Fabrication
Extended Abstracts, ECS Fall Meeting Aug 1997, p2482 (pdf,
416,907 bytes)
Buried WSi SOI Structures
IEEE International SOI Conference, Oct 1995, Paper 5.3, pp135-137 (pdf,
619,632 bytes)
Mechanical Thinning for
SOI Physics and Applications III (ECS Proceedings series, PV 95-7,
Pennington, NJ, 1995), p56 (pdf, 425,492 bytes)
Optical Properties of
Bonded Silicon Silicide on Insulator (S2OI) A New Substrate
for Electronic and Optical Devices
Presented at the 2nd International Conference on Spectroscopic Ellipsometry,
Charleston 1997, to be published in "Thin Solid Films" (pdf,
85,774 bytes)